The College of Engineering and Physical Sciences (EPS) at Aston university is creating a III-V semiconductor fabrication facility. As a consequence, we are seeking a single supplier to provide a suite of plasma processing tools for:
• ICP Etch of semiconductor materials (e.g. GaAs, GaN, InP, GaSb)
• RIE Etch of dielectric materials (e.g. SiO2, SiNx) and metals (e.g. Au, Ge, Cr, Ti, Pt, Pd)
• Deposition of dielectric layers (e.g. SiO2,…

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